Silicon Wafer - Organic Contamination
In this example, a silicon wafer was measured with the Simultaneous Thermal Analyzer STA 449 F1 Jupiter®® coupled to the mass spectrometer QMS Aëolos® Quadro.
The large sample (1.6 g) was placed into an Al2O3 crucible (volume 5 ml) and heated to 800°C at 10 K/min under synthetic air.
Two very small mass-loss steps (0.002% and 0.008%) occur prior to 700°C due to the release of organic components.
To ensure clear demonstration, only the mass numbers m/z 15, 51, and 78 are presented here.